| 摘要 |
PURPOSE:To supply thoroughly mixed gases and improve film quality by providing a part of mixing >=2 kinds of raw material gases or carrier gases in a reaction chamber in a vacuum chemical vapor growth (vaccum CVD) device. CONSTITUTION:This mixing device 23 is mounted by means of screw holes 31 to the flange 21 of the vaccum CVD device so as to close hermetically the reaction chamber together with the door 20 of the vaccum CVD device body by means of a flange 30. Raw material gases or carrier gases are introduced through gas lead-in ports 22, 32 directly into the device 23. These gases are introduced quickly into the device 23 put under vacuum, and create turbulent flow, by which they are mixed and the mixed gases are released through an outlet 33 into the reaction chamber. Since the device 23 is in a room temp. region of low temp., the amt. to be stuck with the product of reaction is slight and since it is possible to view the same, it can be easily removed and washed. hence, this device 23 is effective in improving the film quality and simplifying maintenance. |
