发明名称 MASKE ZUR VERWENDUNG BEI LITHOPRAPHISCHEN VERFAHREN
摘要 <p>A mask for use with soft X-rays or flood beams of ions comprises a thin metallic foil 12 transparent to X-rays and ions supported in tension on a frame 10 and carrying a pattern 20 opaque to the X-rays and ions. The frame, which is opaque to the X-rays and ion beams but transparent to visible light extends beyond the edge of the foil and carries markings for optically aligning the mask with a substrate this allows conventional registration techniques to be used while achieving high resolution due to the exposure with X-ray or ion beams. <IMAGE></p>
申请公布号 DE3150056(A1) 申请公布日期 1982.07.15
申请号 DE19813150056 申请日期 1981.12.17
申请人 WESTINGHOUSE ELECTRIC CORP. 发明人 D. BLAIS,PHILLIP
分类号 G03F1/22;G03F9/00;H01L21/027;(IPC1-7):03F9/00;01L21/308;01L21/72 主分类号 G03F1/22
代理机构 代理人
主权项
地址