| 摘要 |
PURPOSE:To prevent the resticking of foreign matter removed from a photomask by immersing the photomask in a washing soln. and applying both scrubbing and washing by beating. CONSTITUTION:A photomask 1 is attached to the fixer 5 of a fixer rotating mechanism 6 and rotated at a low speed such as 5-100rpm, and a washing soln. 9 contg. no fine particles is fed from a plurality of holes pierced in a forced feeding device 10 so that the face of the photomask 1 to be washed is constantly immersed in the soln. 9. By actuating a feeding mechanism 13, the unused part of a buffer material 12 is brought into contact with a press contacting section 11, and by working a scrubbing and beating mechanism 15, the material 12 is pressed on the face of the photomask 1 to be washed. The pressed part is then moved longitudinally and laterally or circularly in parallel to the face, and simultaneously the arm 14 is moved up and down. Thus, the photomask 1 is scrubbed and washed by beating. |
