发明名称 |
METHOD AND DEVICE FOR INSPECTING ARTICLE TO BE INSPECTED WITH PATTERN |
摘要 |
This describes an automatic beam alignment and defect inspection system for masks. The system causes each field or sub-field to be individually aligned for inspection irrespective of the previous alignment of the mask or any other field or sub-field. This is accomplished by scanning a preselected portion of each field of sub-field, with a beam and adjusting the position of the deflection based on the reflected signal while scanning a pre-established portion of the selected field or sub-field. In this way a portion of each selected field or sub-field is used as an alignment mark and stepping errors avoided. Once alignment is achieved a beam spot, comparable to the size of the minimum defect to be detected is scanned over the selected field or sub-field with an overlapping scan to find defects such as mask material in improper places or points where the mask material is missing. |
申请公布号 |
JPS57113227(A) |
申请公布日期 |
1982.07.14 |
申请号 |
JP19810164339 |
申请日期 |
1981.10.16 |
申请人 |
INTERN BUSINESS MACHINES CORP |
发明人 |
CHIYAARUZU II BENJIYAMIN;DEEBITSUDO JIEI KURAUFUOODO;DONARUDO II DEEBISU;RICHIYAADO DEI MUUA;FUIRITSUPU EMU RAIAN;EDOWAADO BUI UIIBAA |
分类号 |
G01B15/00;G01N23/225;G03F1/86;H01J37/28;H01J37/304;H01L21/027;H01L21/66 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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