| 摘要 |
PURPOSE:To facilitate the function diagnosis based on the compared results by reading directly the output of an electron beam exposure control device in a computer and comparing it with the data in the computer. CONSTITUTION:There are provided a control device 3 for converting pattern data relative to the size and position of the pattern from a computer 2a to a deflecting position data for controlling the deflection of an electron beam, and a memory 12 for temporarily storing the data produced from the device 3. The deflected position data read in the computer 2a is compared by a comparator 2c with the pattern data in the computer, thereby producing the compared result. Thus, the size, deflected position, number of decomposition and various corrected calculation results of the composite pattern can be checked without drawing on the wafer. Accordingly, a trial can be facilitated. |
