| 摘要 |
PURPOSE:To perform stable exposure in a variable rectangular beam exposure apparatus having an automatic pattern dividing and exposing functions by dividing the number of the final stage of the pattern size into two shots for exposure. CONSTITUTION:A pattern size of lateral dimension l of a specimen is stored in a register 16. The maximum beam size (s) is contained in a register 17. X-direction pattern start position X0 is stored in a register 18. In case of l>s, the size (s) is doubled by a multiplier 21, is then applied to a comparator 23, and is supplied to a latch circuit 25 via an adder 24. Then, the subtractor 19 which receives the number (s) of shots produced and the integral value ns produces an output obtained by subtracting the pattern size (l) by the ns to the comparator 23. In case of 2s<l-ns, the output (l-ns)/2 from a divider 20 inputted to a gate circuit 26 in case of 2s>l-ns is outputted from the gate circuit 26. In case of 2s>l-ns, the output of the register 17 is produced from the circuit 26. At this time the beam position output is formed by adding the output of the circuit 25 and the pattern start position to the adder 27. |
