| 摘要 |
PURPOSE:To prevent a rinse solution or remaining developer after treatment from falling from a nozzle by connecting a pipe from a solution returning unit to the midway of a developer pipe, thereby preventing the liquid from dropping from a solution discharging nozzle to the surface of a wafer. CONSTITUTION:In development, pressure is applied to a developer returning unit 10 to compress bellows 11. Then, a solenoid valve 7 is opened, and a developer 9 is fed under pressure from a solution storage container 8 to a solution discharging nozzle 5. Thus, the developer is sprayed or dropped on the surface of the wafer 2. After the set prescribed time, the valve 7 is closed to stop the feeding. Then, the supply of the pressure to the unit 10 is stopped to be returned to the atmospheric pressure. The belows are elongated to the returning quantity control screw 12. Thus, the remaining developer is returned from the end of the nozzle 5 to the inside by the absorption of the elongated part. |
