A method of depositing a polymer film on a substrate.

摘要

This invention relates to a method of depositing a polymer film on a substrate. The substrate is placed in a chamber, and an aromatic silane monomer which contain hydrogen only as part of a phenyl group or attached to a silicone atom is supplied to the chamber. The monomer in the chamber is subjected to a radio frequency glow discharge at a substrate temperature from 50 DEG C to 450 DEG C and at a pressure between 4 and 133.32 pascals whereby the monomer is polymerised and deposited on the substrate.