发明名称 Etching method using a hardened PVA stencil
摘要 The method comprises producing on the surface to be etched a stencil of a light-hardened PVA. The stencil is produced by light hardening selected portions of a film or coating consisting essentially of dichromate-sensitized PVA. The PVA is about 85% to 97% hydrolyzed and has a molecular weight of 75,000 to 100,000. After light hardening, the nonhardened portions of the film are removed, thereby producing the stencil. The stencil is baked to improve its etch resistance, the surface is etched through the stencil, and then the stencil is removed from the surface.
申请公布号 US4339528(A) 申请公布日期 1982.07.13
申请号 US19810265108 申请日期 1981.05.19
申请人 RCA CORPORATION 发明人 GOLDMAN, ABRAHAM
分类号 C23F1/02;G03F7/04;G03F7/12;H01J9/14;H05K3/06;(IPC1-7):C23F1/02;G03C5/00 主分类号 C23F1/02
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