发明名称 PHOTOSENSITIVE POLYMERIZING COMPOSITION
摘要 <p>This invention comprises a photopolymerizable composition and a method of photopolymerizing said composition, said composition containing a monomer having a single acrylate substituent on a benzene ring. The resulting speed of the composition is superior to compositions wherein the monomer has more than one acrylate substituent on the ring.</p>
申请公布号 JPS57112743(A) 申请公布日期 1982.07.13
申请号 JP19810183194 申请日期 1981.11.17
申请人 EASTMAN KODAK CO 发明人 MAIKURU FURANTSU MOREIRE
分类号 C07C69/78;C08F2/50;C08F20/30;G03F7/027;G03F7/032 主分类号 C07C69/78
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