Ultra-violet lithographic resist composition and process
摘要
Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
申请公布号
US4339522(A)
申请公布日期
1982.07.13
申请号
US19800200296
申请日期
1980.10.24
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
BALANSON, RICHARD D.;CLECAK, NICHOLAS J.;GRANT, BARBARA D.;OUANO, AUGUSTUS C.
