| 摘要 |
PURPOSE:To correct the displacement of the position of a dry plate due to the expansion and contraction of a stage by mounting a member to which a mark is formed to the dry plate, scanning the mark by electron beams and detecting the position and revolution of the dry plate in an electron ray exposure device. CONSTITUTION:The dry plate 7 is inserted to a dry plate holder 13 from the arrow K direction, the quartz glass members 14, 15 to which the marks M1, M2, M3 and M'1, M'2, M'3 are carved are inserted, and the members are held down by control plates 16, 17, 18. The dry plate 7 is pushed toward the member 14 by using leaf springs 19, 20, a sliding plate 21 with springs 24, 25 is mounted, and the dry plate 7 is pushed toward the member 15. Accordingly, the dry plate 7 is fixed, electron rays are deflected by means of a deflection instrument and the dry plate is exposed, but the marks such as the mark M1 and the mark M2 are scanned at every fixed time during an exposure period, and an electron beam deflection system is fed back in response to the quantity of variation with the positions of the marks M'1, M'2 detected at the last time, thus correcting the displacement of the position of the dry plate 7. |
