发明名称 EXPOSURE DEVICE FOR ELECTRON BEAM
摘要 PURPOSE:To give the optimum quantity of irradiation to each pattern element, and to prevent the increase of pattern data by affording indexes indicating the quantity of electron beams irradiated to each pattern element and giving the quantity of irradiation to each pattern element while referring to a table on the basis of the indexes. CONSTITUTION:A logic circuit 103 decodes the pattern data 201-209, the addresses of the beam irradiation quantity table 102 are formed from the indexes of the quantity of irradiation, irradiation quantity data 211-219 are read, and the quantity of irradiation is set. Accordingly, the quantity of data is halved as compared to the case when directly designating the quantity of irradiation, and the beam irradiation quantity table 102 may be replaced with records corresponding to resists used and the intensity of beams and the pattern data 101 need not be changed even when the resists differ.
申请公布号 JPS57111026(A) 申请公布日期 1982.07.10
申请号 JP19800188949 申请日期 1980.12.26
申请人 NIPPON DENSHIN DENWA KOSHA;HITACHI SEISAKUSHO KK 发明人 FUJINAMI AKIHIRA;MATSUDA KOREHITO;MORIYA SHIGERU;OZASA SUSUMU;ISHIGA TADAKATSU
分类号 H01L21/027;H01J37/317;(IPC1-7):01L21/30 主分类号 H01L21/027
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