| 摘要 |
PURPOSE:To contrive high-speed patterning by a method wherein, after the patterning has been performed on every other split region of the prescribed number of a subcell, the remaining split regions are successively patterned, and a subcell is patterned by giving a plurality of scannings of radiant ray beam. CONSTITUTION:The subcells 2a-2i are formed into a single subcell 3, and the drawn pattern in the subcell is split in horizontal direction at the point where a sudden change occurs, and are divided into a plurality of pattern groups 4a-4e. Besides, the width in horizontal direction of the pattern groups 4a-4e is to be set at in such a manner that the positional change of an electron beam can be circuitously followed. Pattern groups 4a, 4c and 4e are patterned by scanning electron beam, in other words, the pattern groups 4a-4e are patterned every other group. Then, the remaining pattern groups 4b and 4d are patterned by performing the second scanning. |
