| 摘要 |
PURPOSE:To perform an excellent liquid chemical treatment by a method wherein a gas inhaling mechanism, with which clean gas is taken in, is provided in the subject liquid chemical treating device, and the wafting splashes of liquid chemical are quickly exhausted. CONSTITUTION:The liquid chemical treating device is constituted of a rotating stage 5, a lower cup 2, an upper cup 1, a liquid chemical jetting mechanism 7, and a forced exhausting pipe 8. On the upper cup 1, a gas inhaling mechanism 9, consisting of an air inlet 10 and a filter 11 made of chemical-proof material, is installed. When photoresist film is formed, a large quantity of the outside air flows into the treatment chamber 3 from the air inlet 10 passing through the filter 11, and the splashes of the liquid chemical are quickly exhausted from the exhausting pipe 8. As a result, the mist-type waste liquid and photoresist grains are not scattered, and the mist-formed waste fluid and photoresist grans, which are scattered by the rotation of a stage 5 or stuck against the inner wall of the treatment chamber and splashed back, are not wafting for a long period of time and quickly exhausted. |
