| 摘要 |
PURPOSE:To avoid occurrence of a crack on a substrate surface while permitting a pure clothes to make contact with the substrate surface at all times by forming the clothes in a windable structure like a belt, in a wafer scrubber for establishing a purification by rubbing the substrate surface of a semiconductor with the clothes. CONSTITUTION:A wafer 1 to be purified is mounted on a rotatable wafer chuck stage 2 and the surface of the wafer 1 is purified by rubbing the surface of the wafer with a scrubber material 3 including a brush or clothes. Based upon such a constitution, the scrubber material 3 is formed in a belt shape, the scrubber material 3 is wound by two roll rods 5 and a press rod 1, at the same time it makes contact with the surface of the wafer 1, the surface of the wafer 1 is rubbed by a pure scrubber material to establish the purification for the wafer, and the scrubber material 3 is replaced after it has been used for a long time. The purification can be performed more effectively by shifting the scrubber material 3 vertically or transversely. In such a way, a crack due to the dusts adhered on the wafer 1 can be prevented and further occurrence of contamination also be avoided. |
