发明名称 MANUFACTURE OF SEMICONDUCTOR
摘要 <p>PURPOSE:To obtain a device having a high withstand voltage by a method wherein when a reverse mesa type semiconductor pellet is made, initially the entire surface of an electrode layer is covered with wax, a shallow and wide slot is provided in the mesa slot formed by using a dicer having a flat cut face, again the wax is coated and a V-figure deep mesa slot is provided in the slot by using a dicer having a V-figure cut face. CONSTITUTION:A base layer 2 is provided on a collector layer 1 and an emitter region 3 for pellet use is formed in the region 2. Subsequently, this side is covered with a surface sheet 15, an electrode layer 4 is attached to an opposite face and a reverse mesa slot is provided through a dicing to form the pellets including the region 3 respectively. For reasons of this process, wax 16 is coated on the entire face of the electrode layer 4, and a shallow and wide slot 21 to invade into the layer 1 is formed by using a first dicer 20 having a flat cut face. Thereafter, again the wax 22 is coated, a mesa slot 24 reaching to the layer 2 is formed in the slot 21 by utilizing a dicer 23 having a V-figure cut face and a damage layer 25 is removed through an etching, thereafter it is separated into an individual pellet.</p>
申请公布号 JPS57107039(A) 申请公布日期 1982.07.03
申请号 JP19800185272 申请日期 1980.12.25
申请人 SHIN NIPPON DENKI KK 发明人 YOSHIDA MASAHIRO
分类号 H01L21/301;H01L21/306;H01L21/331;H01L29/73 主分类号 H01L21/301
代理机构 代理人
主权项
地址