| 摘要 |
PURPOSE:To measure the thickness of a film with high precision eliminating measuring errors owing to a temperature fluctuation by using an oscillator for measuring the thickness of a film by vapor deposition and an oscillator for compensating temperature. CONSTITUTION:The thickness of a film by vapor deposition is measured by measuring in the heterodyne system the difference in the frequency of two quartz oscillator X1 and X0 connecting a quartz oscillator for measuring the thickness of a film by vapor deposition X1 and an oscillator for compensating temperature X0 to a mixer. When the frequency f1 of the quartz oscillator X1 and the frequency f0 of the quartz oscillator X0 are mixed by the mixer, two frequencies of f0+f1 and f0-f1 come out as an output, out of which only the frequency f0-f1 is taken out as the output. |
