| 摘要 |
PURPOSE:To provide the vacuum type treatment apparatus capable of automatically opening and closing a cover of a vacuum chamber and automatically taking in and out a carrier consisting of a tank, a cover with a suspension means, a means for opening and closing the cover and a treatment tank. CONSTITUTION:When a cover 2 is closed, a carrier mounting a semiconductive wafer is suspended from a hanger 3 and, when a motor 6 is driven downwardly, a screw 8 is rotated to move a moving element 9 downwardly. Therefore, the cover 2 fixed to an arm 4 is also moved downwardly to close a tank 1 as well as to sufficiently immerse the carrier 12 into an etching liquid in an etching tank 10 and the cover 2 and the tank 1 are sealed by an O-ring 5. Next, the tank 1 is exhausted from an exhaust port 11 to evacuate an inside thereof. Further, an inner wall of the cover 2 is made flat so as not to drop the etching liquid adhered to said inner wall onto a surface of the semiconductive wafer as well as inclined so as not to fall the same into the tank 10. |
