发明名称 DISPENSER OF SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE:To apply coating liquid on outer walls of nozzles completely on an object by an method wherein the nozzles for coating are inclined to a certain degree against a perpendicular direction. CONSTITUTION:A certain volume of liquid 2 is blown out from tips of a plurality of nozzles 8 inserted into coating blocks 4, 7 with a certain degree of inclination. For instance, the liquid 2 blown out from the nozzle 8 with 45 deg. inclination is in a situation shown in Fig. a but due to a surface tension the liquid comes up to the upper left direction on the outer wall of the nozzle 8. But as the nozzle 8 has the inclination a balance of surface tension is broken and the liquid is gathered at the lower side of the outer wall of the nozzle 8. If the liquid is applied on an object in above situation, the liquid 2 on the outer wall is transferred completely to the object and no liquid is left on the outer wall of the nozzle.
申请公布号 JPS57102020(A) 申请公布日期 1982.06.24
申请号 JP19800179188 申请日期 1980.12.17
申请人 MITSUBISHI DENKI KK 发明人 YOSHINO KAZUHIRO
分类号 H01L21/027;G03F7/16;(IPC1-7):01L21/30 主分类号 H01L21/027
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