| 摘要 |
PURPOSE:To provide the titled apparatus capable of forming a metal thin film with a multi- layered structure within a short time and enhancing productivity thereof to a large extent which carries out vapor deposition of different kinds of vapor deposition substances against a film like substrate material when said substrate material is transferred to either forward and backward directions. CONSTITUTION:Between times when a film like substrate material 4 is transferred to forward and backward directions, a pair of evaporation source containers 6A. 6A' provided to left and right sides of a separating plate 5 are constituted so as to be replaced with other pair of evaporation source containers 6B, 6B'. Then, when the substrate material 4 is transferred from a supply roll 12 to a winding roll 13, slide plates 16, 16' are slid to mutually parted directions and, thereby, as shown in a Figure B, electron beams 11, 11' are irradiated to the evaporation substances 7, 7' in the containers 6A, 6A' to carry out vapor deposition of the substrate material 4. On the other hand, when the substrate material 4 is transferred to a direction revers to said direction, the slide plates 16, 16' are slid to mutually approached directions. Thereby, as shown in a Figure C, the substances 7, 7' in the containers 6B, 6B' are irradiated with electron beams 11, 11' and, therefore, even when the substrate material 4 is transferred to the reverse direction vapor deposition of a metal thin film is carried out under a condition similar to the condition when transferred to the forward direction. |
