| 摘要 |
PURPOSE:To improve the manufacturing yield of an IC by discovering a defect on a photomask used for manufacturing the IC simply and correcting the defective part. CONSTITUTION:The pattern information of a photomask 1 held on a movable stage in X-, Y- and Z-directions is read by a television camera 3 via a microscope 2 and is converted into a video signal (a). On the other hand, data of pattern design of an IC is converted to a video signal (b) via a pattern data generator 4. The generator 4 receives the video signals (a), (b) and a video indicator 5 indicates pattern videos A, B on the screen. |
