| 摘要 |
PURPOSE:To enlarge an allowance of specimen tilting in a luster scan type exposure method by a method wherein a frame is separated in the direction of table transfer according to the specimen tilting, and a table is moved stepwise in the vertical direction for each exposure at each division of the frame. CONSTITUTION:A specimen wafer 1 is put on an XY table, and a tilt angle theta aginst the table movement direction (Y) from marker positions, for example, 23a and 23b. From the theta value, the number of divisions of one exposure frame 21 is determined so that the maximum width of deflection W'max in the X direction of the beam on a division region 21a does not exceed the maximum allowable deflection width of the device. After the table has been moved in the Y direction and exposure for the division region 21a has been completed, the table will be moved stepwise in the X direction according to theta and the number of divisions, and the next division region 21b is exposed. With this process, an allowance of tilting in the positioning direction of a specimen can be enlarged so the positioning of a specimen can be facilitated in a short time to enhance its throughput. |
