| 摘要 |
PURPOSE:To increase the accuracy of shape, by manufacturing the quartz oscillator via chromium etching process, gold etching process and quartz bar etching process, in the manufacture of a quartz oscillator with chemical etching process. CONSTITUTION:After depositing a Cr thin film 4 on both sides of a quartz thin plate 1 with sputtering or vapor deposition, a photoresist 5 is coated, the photoresist 5 is exposed and developed and the Cr thin film 4 is etched. After the photoresist 5 is removed, an Au thin film 6 is deposited and a photoresist 7 is coated. The photoresist 7 is exposed and developed and the Au thin film 6 is etched. The quartz thin plate 1 is etched to obtain the same form as the photoresist 7, Au thin film 6 and Cr thin film 4 and to form a tuning fork type quartz bar. |
