发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To make adhesion of a semiconductor element with a substrate of semiconductor device favorable by a method wherein an Au-Si solder material is adhered directly on the upper face of Ni plating of the electrode substrate, and the semiconductor element is put thereon and Au-Si eutectic soldering is performed. CONSTITUTION:The Au-Si solder material is adhered on the upper face of the electrode substrate 1 being treated with Ni plating using a laser beam. At this time, because sizs of spot of the laser beam is small, the spot thereof is made to irradiate on the whole surface of the Au-Si solder material 4, or at least the whole circumferential end part of the Au-Si solder material 4 is irradiated to perform adhesion. The semiconductor element 5 is adhered by Au-Si eutectic soldering through the Au-Si solder material 4 adhered on the electrode substrate 1 thereof.
申请公布号 JPS5797631(A) 申请公布日期 1982.06.17
申请号 JP19800173275 申请日期 1980.12.10
申请人 HITACHI SEISAKUSHO KK 发明人 SHIMAOKA MAKOTO;UDAGAWA TSUGIO;SAKAMOTO TATSUJI
分类号 H01L21/52;H01L21/58;(IPC1-7):01L21/58 主分类号 H01L21/52
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