| 摘要 |
PURPOSE:To improve the precision of position detection by providing polishing detection parts in parallel to a polished surface and thus forming the electrode structure which has the parallel circuit of the detection parts by two lead-out electrodes extending from both ends of each detection part to the polished surface vertically. CONSTITUTION:Polishing electrodes 3 and 3 provided at both sides of thin-film elements 2, 2' and 2'' are constituted by forming polishing detection parts 31a, 31b, 31c, and 31d in parallel to a polished surface 11 and at adequate intervals, and also forming lead-out electrodes 32 and 33 extending vertically to the polished surface 11 at both ends of the polishing detection parts 31. The polishing electrodes vary in resistance stepwise rapidly. A polishing position is detected by the rapid variation in the resistance value of the polishing electrodes 3, so the detection is facilitated. |
