| 摘要 |
PURPOSE:To permit quick and sure cleaning treatment of a mask and reticle to be used for wafer exposing by pressurizing the inside of a cleaning liquid tank up to a prescribed pressure and heating the cleaning liquid in the tank up to a desired temp., then injecting the cleaning liquid from nozzles toward the object to be cleaned. CONSTITUTION:After the inside of a cleaning chamber 11 is pressurized to the prescribed pressure, the inside of the chamber 11 is heated by a heater 18 until the prescribed temp. is attained. The cleaning liquid in the cleaning liquid tank 12 is heated by a heater 19 and the inside of the tank 12 is pressurized up to an adequate pressure by a pressurizing means 25 so that the cleaning liquid is heated up to the temp. above the b.p. The cleaning liquid is injected from the ends of the cleaning nozzles 13 toward the mask 10 when a valve 21 is opened after a three-way valve 22 is operated to supply the cleaning liquid to the mask 10. Cleaning brushes 20 are simultaneously brought into contact with both faces of the mask and are driven by a motor 23 to rotate at a low speed. The cleaning liquid is thereby injected to the mask at such a low temp. at which the cleaning power of said liquid is sufficiently exhibited. The quick cleaning treatment is thereby permitted. |
