| 摘要 |
PURPOSE:To pattern a thin film with high precision by depositing an organic resin film and a metal film on a thin film on a step part on a substrate to reduce the step, by patterning the metal film highly precisely to take said film as a mask and by patterning the organic resin film. CONSTITUTION:A lower part magnetic substance film 2 is formed on a substrate 1, and an electric conductor 4 wound in a plural number of turns and the second insulating layer 6 insulating among the conductors are formed on the first insulating layer 5. Further, an upper part magnetic substance 3 comprising permalloy is formed, and polyimide resin 7 is applied so that when a step D is 6mum, a step E after applied is reduced to 1.5mum. A Mo metal film 8 is formed, and a photoresist is applied. And, by patterning said resist to use it as a mask, a Mo film is patterned, and then by using the Mo film as a mask the resin 7 and permaloy are patterned. Hereby, a high precision pattern is formed for a thin film having a step, in particular, a magnetic substance film on a magnetic head. |
