发明名称 PLASMA DEPOSITING METHOD
摘要 PURPOSE:To prepare a semipermeable film with good preciseness in film thickness and good quality by moving ion formed by subjecting a stock gas to plasma conversion throughout a magnetic field to reach the same to a surface of a substrate plate. CONSTITUTION:A stock gas such as a monosilane gas or the like is supplied into a reaction tube 1 to be subjected to plasma conversion and, thereafter, the formed ion is moved throughout a magnetic field. Then, Lorentz force is acted on the ion and cation is bent downwardly and anion upwardly. As the result, the cation is reached to a lower electrode 4 and the anion to an upper electrode 5 and electromotive force is generated between both electrodes. In this condition, when both electrodes 4, 5 are connected, because the ions are converted to an atom or an atomic group, said ions are deposited on a conductive substrate plate of the electrodes. Thereby, a semiconductor which has good preciseness in film thickness, is free from contamination and has good quality is prepared.
申请公布号 JPS5791734(A) 申请公布日期 1982.06.08
申请号 JP19800166175 申请日期 1980.11.26
申请人 FUJITSU KK 发明人 FURUMURA YUUJI;SATOU YASUHISA
分类号 C23C14/32;B01J19/08;C23C16/50;C23C16/507;H01J37/32;H01L21/02;H01L21/205 主分类号 C23C14/32
代理机构 代理人
主权项
地址