发明名称 HEATING METHOD FOR SUBSTRATE SURFACE IN VACUUM CONTAINER
摘要 PURPOSE:To obtain a film of high quality by surrounding cylindrical heat beam projecting window for passing a heat beam for heating the surface of a substrate in a vacuum container with a reflecting mirror, thereby preventing the exhaust of impurity gas from a heat source. CONSTITUTION:The surface of a substrate 1 placed in a vacuum container 4 is emitted with the heat wire of an infrared ray lamp 11 via a cylindrical projecting window 10 formed at the side wall of the container 4. The cylindrical portion of this window 10 is formed of a transparent quartz cylinder 14 sandwiched with a thin film 13 having good reflectivity such as aluminum, the infrared ray passes through the cylindrical transmission plate 15 sealed at 16 in vacuum to heat the substrate 1. The heat out of the container is transmitted via radiation, conduction and reflection, but since the heat is transmitted only by radiation in the window in vacuum, the interior of the container is not contaminated, thereby forming a film of high quality.
申请公布号 JPS5791526(A) 申请公布日期 1982.06.07
申请号 JP19800167534 申请日期 1980.11.28
申请人 FUJITSU KK 发明人 TABUCHI SHIYUUJI
分类号 C23C14/50;C30B23/06;H01L21/205;H01L21/285;H01L21/31 主分类号 C23C14/50
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