发明名称 MASKING METHOD FOR PATTERN FORMING
摘要 PURPOSE:To enable a mask to be adhered firmly in all the corners and to enable masking of even a complicated pattern, by a method wherein a base substrate is mounted on a magnet to adhere a mask firmly to the base substance through the exerting of a magnetic force. CONSTITUTION:A magnet plate 2 is mounted to a base fixture bed 1, and an aluminium substrate 3 is placed as a base substrate thereon to adhere a mask 4 to the substrate 3 through the exerting of a magnetic force thereon. A copper plate is attached as a target 6 to a target fixture bed 7, and after a film is formed by a spattering, the mask 4 is peeled off to form a pattern on the substrate 3 with copper. The masking process enables the mask 4 to be adhered firmly in all the corners, prevents the distortion of the mask, and permits masking of even a complicated patten.
申请公布号 JPS5788726(A) 申请公布日期 1982.06.02
申请号 JP19800165042 申请日期 1980.11.21
申请人 MATSUSHITA DENKI SANGYO KK 发明人 KONISHI KOUICHI
分类号 H01L21/285;(IPC1-7):01L21/285 主分类号 H01L21/285
代理机构 代理人
主权项
地址