| 摘要 |
PURPOSE:To enable attainment of a uniform size of an exposure pattern by oscillating eletron beams finely also in the direction different from the direction of scanning. CONSTITUTION:Electron beams 2 generated by an electron gun 1, converged by electron lenses 3, 4 and 7 and arriving at a body to be processed are scanned by a deflection magnetic pole 6. In the exposure device thus constituted, two pairs of auxiliary deflection plates 8, for instance, are arranged so as to have the field directions perpendicular to each other, and a sine-wave signal having a phase difference at an angle of 90 degrees is given to the deflection plates 8 from an auxiliary deflection circuit 14 to give a circular motion within a plane parallel to the surface of a sample to the beams 2 having passed the lens 7. It may also be well that a deflection signal for compensating the size is mixed in a deflection signal for deciding the position of electron beams and given to a deflection circuit 13. By this constitution, the size compensation which is essential to preparation of a reticle can be achieved simply without changing pattern data. |
