Apparatus for detecting a mutual positional relationship of two sample members

摘要

An apparatus for detecting a mutual positional relationship of a semiconductor wafer and mask comprises first and second diffraction gratings formed on the wafer and mask and located parallel to each other; a laser source for radiating a coherent light vertically toward the first and second diffraction gratings; a drive mechanism for periodically varying a relative distance between the first and second diffraction gratings; a pair of photosensors for receiving a first interference beam resulting from those +n-order diffracted beams included in said diffracted beams and a second interference beam resulting from those -n-order diffracted beams included in said diffracted beams; and a differential amplifier calculating the difference between the intensities of the first and second interference lights thereby detecting a mutual positional displacement between the first and second diffraction grating.