| 摘要 |
PURPOSE:To highten tightness of a substrate and make mechanical exfoliation possible by covering a substrate attached with a photoresisting film by a protective resin film and by exfoliating the protective resin film with gas generated by the photoreaction of the photoresisting film by ultraviolet rays. CONSTITUTION:When storing a substrate the required region of said substrate is attached by a photoresisting film to be covered with a protective resin film. Then, when using the substrate, said substrate is irradiated by ultraviolet rays to make the photoresisting film to cause the photoreaction and to form an air gap between the substrate and the protective resin film with gas produced by the photoreaction for exfoliating the protective resin film from said air gap. |
