发明名称 PLASMA CVD DEVICE
摘要 PURPOSE:To prevent a film from forming uselessly, harmfully and wastefully on the wall of a vaccum container, by providing a heater which heats the wall of the vacuum container. CONSTITUTION:In a vaccum container 1, reaction gas is induced from an inlet 2 by selecting in accordance with a type of thin layers to be formed, and exhaust gas after reaction is exhausted to an outlet 3. In it parallel plate electrodes 4, 5 and provided, and a heater 8 is provided on one of these electrodes. A thin film is formed here by crashing plasma to a substrate 7. A useless, harmful film is prevented from forming on the wall of the vacuum container 1, by providing a heater 10, which heats the wall 9 of the vacuum container 1, on the container exterior. A film formed unavoidably on the wall 9 is sticked densely and tightly, and prevented from removing and scattering.
申请公布号 JPS5785220(A) 申请公布日期 1982.05.27
申请号 JP19800162200 申请日期 1980.11.18
申请人 FUJITSU KK 发明人 TAKASAKI KANETAKA;KOYAMA KENJI
分类号 C23C16/509;H01L21/205;H01L21/31 主分类号 C23C16/509
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