| 摘要 |
PURPOSE:To void hillock and reduce time lag by mounting a supporter made from silicon or carbonic silicon in a concave of quartz plate and accumulating a semiconductor substrate on a supporter. CONSTITUTION:A concave 13 is provided to mount a semiconductor substrate 2 on one main surface of a supporter base 11 made from high-pure quartz. A supporter 12 made from silicon or carbonic silicon almost equal in thermal capacity with the substrate 2 is mounted at the concave 13 bottom. This prevents silicon from hillock such as scattering from the supporter base 11 or a reaction container and sticking to the substrate 2. |
