| 摘要 |
PURPOSE:To enlarge the effective area on a wafer and to remove complexity of positioning of a semiconductor device by a method wherein a means to perform coating of signals for identification of informations relating to the semiconductor wafer along the circumferential part of respective wafer is provided. CONSTITUTION:When various kinds of progress of work are to be performed on the surface of the nearly circular semiconductor wafer to form an integrated circuit, the means to perform coating of signals for identification of the various informations relating to the semiconductor wafer along the circumferential part of the wafer is provided. By providing the coating region 3 along the circumferential part of the wafer 1, for example, the effective region 4 can be enlarged to the maximum limit. Moreover the writing and reading progress of work of the signals to the coating region 3 can be made to be possible by positing the center of the wafer 1 and by rotating the circular wafer 1, and automation of progress of work thereof is facilitated. |
