| 摘要 |
NEW MATERIAL:A photosensitive compound of formula I. USE:A component of phtotosensitive resins: the spectral sensitivity is especically high in the range of 300-400nm. The combination thereof with a sensitizer enables the sensitization in more long-wave zones, i.e., over a wide range in the visible zone. PREPARATION:The condensation reaction of a compound of formula II with a double amount of a compound of formula III or its derivative gives the compound of formula I. The compound of formula I is contained in a solution of a high-polymer compound such as natural rubber soluble in a solvent, modified rubber such as cyclic rubber, synthetic rubber such as styrene-butadiene rubber by a small amount, e.g., 0.1-10wt% and used as a photosensitive resin. The solution is coated on a base plate, irradiated with light according to the objective image and developed with a solvent. The parts exposed to light are insolublized to form the image. The raw materials are readily available, inexpensive and the compound of formula I is easily produced in high yield. |
