发明名称 Thermal gradient control for enhanced laser induced crystallization of predefined semiconductor areas
摘要 A method for laser induced conversion of large predefined areas of amorphous or polycrystalline semiconductor material, disposed nonepitaxially upon a substrate, into large single crystal areas, by controlling the lateral heat flow out of the melted regions of the areas for causing their recrystallization from a single nucleation site and for suppressing the formation of competitive nucleation sites at their edges.
申请公布号 US4330363(A) 申请公布日期 1982.05.18
申请号 US19800182195 申请日期 1980.08.28
申请人 XEROX CORPORATION 发明人 BIEGESEN, DAVID K.;JOHNSON, NOBLE M.;BARTLELINK, DIRK J.;MOYER, MARVIN D.
分类号 H01L21/20;H01L21/268;H01L31/18;(IPC1-7):C30B13/06 主分类号 H01L21/20
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