发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To prevent a glass from being corroded during a plating process, by a method wherein, in case an electrode is formed by a plating method on a semiconductor device with a recess having an exposed junction and being coated with glass, the glass is previously protected with a medicine resistant ink. CONSTITUTION:A wafer 1, wherein a recess is covered with a glass 2, is prepared, and a medicine-resistant resist ink 4 is screen-printed on a region, except a part where an electrode is formed, of the wafer 1. An oxidized film 3 is etched with a mixture liquid of hydrofluoric acid and ammonium fluoride through the mask of the resist ink 4. The wafer 1, continuously, is placed in a nickel plated liquid in pH8 and at 80 deg.C, consisting of nickel sulphite hydrophosphorous acid soda, sodium citrate, and ammonium chloride, to form a nickel-plated layer 5. Finally, the resist ink 4 is removed to complete an electrode forming process. This enables the mass production of plated electrodes without the damage of the glass.
申请公布号 JPS5779618(A) 申请公布日期 1982.05.18
申请号 JP19800154674 申请日期 1980.11.05
申请人 HITACHI SEISAKUSHO KK 发明人 MISAWA YUTAKA;SHIODA KATSUHIKO
分类号 H01L21/288;H01L21/28 主分类号 H01L21/288
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