| 摘要 |
An annealing device has a supporting table for a semiconductor wafer, a plurality of flash discharge lamps arranged in a plane parallel and adjacent to the semiconductor wafer on the supporting table, and a concave-convex mirror for reflecting the light from the flash discharge lamps back to the semiconductor wafer. The semiconductor wafer is suddenly and uniformly annealed over its entire area by being exposed to irradiation by the light from the flash discharge lamps. <IMAGE>
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