| 摘要 |
<p>PURPOSE:To provide a thin film thermal head whch has sufficient wear resistance, sufficient chemical stability, sufficient crack resistance, high reliability and long life-time by forming a wear resistant protective film containing mainly SiOxNy on a heating layer formed on a substrate. CONSTITUTION:A 3-element compound thin film resistor layer 2 of Ta-Si-O of 2.0mum thick is formed on an alumina substrate 1 formed, for example, with a glazed layer, Au electrodes 3, 3' of 2mum thick are formed on the necessary parts, and SiOxNy, where x, y represent composition ratio being not 0, of 3mum is formed thereon. An SiOxNy film is obtained by sputtering with Si or Si3N4 as a target in a mixture gas of N2 and O2. It is preferred to vary the composition ratio in thickness- wise direction continuously or discontinuously so that the value of x/y becomes maximum at the heater layer side.</p> |
