发明名称 PHOTO-RESIST TREATER
摘要 PURPOSE:To obtain a device with a development treating section capable of executing excellent development treatment by providing a vessel, into which a developer is introduced, with a temperature control function while forming a plurality of holes for discharging the developer extending over the whole base of vessel itself. CONSTITUTION:A vessel 1, which has a temperature control means 6 controlling the temperature of a developer and to the base 5 of which a plurality of holes 1a for discharging the temperature controlled developer in a shower manner are shaped uniformly, is mounted. The vessel 1 such as a developer holding vessel 1 is formed in sealed structure, and a developer introducing hose 2 for introducing the developer into the vessel from a developer supply source 7, a hose 3 for leakage for bringing the inside to negative pressure by a vacuum pump 11, and a hose 4 for pressure for introducing nitrogen gas from a nitrogen supply source 8 and pressing the inside of the vessel are set up to the vessel. The temperature control hose 6 is fitted into the vessel so as to be brought into contact with the developer, and a warm water in a vessel 9 brought to a fixed temperature through heating by a heater 10 is circulated by a pump 12.
申请公布号 JPS63199424(A) 申请公布日期 1988.08.17
申请号 JP19870031467 申请日期 1987.02.16
申请人 HITACHI LTD;HITACHI MICRO COMPUT ENG LTD;HITACHI HOKKAI SEMICONDUCTOR LTD 发明人 OZAKI KATSUMI;SUGIMOTO ARITOSHI;NAKADA SHOJI
分类号 H01L21/30;G03F7/00;G03F7/30;H01L21/027 主分类号 H01L21/30
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