发明名称 METHOD FOR FIXING MASK FOR VAPOR DEPOSITION
摘要 PURPOSE:To eliminate displacement of a position as well as to facilitate detachment by a method wherein a mask for vapor deposition comprising a magnetic material is placed at a desired position of a substrate plate and fixed to said substrate plate by a magnet through said substrate plate. CONSTITUTION:A mask 2 for vapor deposition comporising a magnetic material is fixed to a desired position by a magnet 6 through a substrate plate 1 and a composite body comprising the substrate plate 1, the mask 2 and the magnet 6 is fixed in the air by a holding tool 4. In this condition, if an evaporation substrate is evaporated from a boat 3, only a periphery on a surface of the substrate plate can be uniformly vapor deposited.
申请公布号 JPS5770273(A) 申请公布日期 1982.04.30
申请号 JP19800145143 申请日期 1980.10.16
申请人 MATSUSHITA DENKI SANGYO KK 发明人 MIYATA TAKEO;ONO TAKUHIRO;HONMA MASAMI;KAWADA KOUICHI;HASHIDATE YUUJI
分类号 C23C14/04;H01L21/285;H01L21/31 主分类号 C23C14/04
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