发明名称 |
METHOD FOR FIXING MASK FOR VAPOR DEPOSITION |
摘要 |
PURPOSE:To eliminate displacement of a position as well as to facilitate detachment by a method wherein a mask for vapor deposition comprising a magnetic material is placed at a desired position of a substrate plate and fixed to said substrate plate by a magnet through said substrate plate. CONSTITUTION:A mask 2 for vapor deposition comporising a magnetic material is fixed to a desired position by a magnet 6 through a substrate plate 1 and a composite body comprising the substrate plate 1, the mask 2 and the magnet 6 is fixed in the air by a holding tool 4. In this condition, if an evaporation substrate is evaporated from a boat 3, only a periphery on a surface of the substrate plate can be uniformly vapor deposited. |
申请公布号 |
JPS5770273(A) |
申请公布日期 |
1982.04.30 |
申请号 |
JP19800145143 |
申请日期 |
1980.10.16 |
申请人 |
MATSUSHITA DENKI SANGYO KK |
发明人 |
MIYATA TAKEO;ONO TAKUHIRO;HONMA MASAMI;KAWADA KOUICHI;HASHIDATE YUUJI |
分类号 |
C23C14/04;H01L21/285;H01L21/31 |
主分类号 |
C23C14/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|