发明名称 RESIST EXFOLIATING DEVICE
摘要 PURPOSE:To prevent the adherence of chips of exfoliated film to a substrate by directing the substrate to be exfoliated with resist downwardly at the upper opening to become a funnel shape on the lower surface, flowing treating solution from the perephery to the center, and absorbing it at the center. CONSTITUTION:A resist exfoliating device has an opening 9 to be mounted with a substrate to be exfoliated on the upper surface, and an opening 10 is formed of a circular slit liquid passage 12 having a funnel shaped treating solution intake port 11 on the lower surface. A passage 12 is connected to a high sealed solution container 14 from an annular resist exfoliating region 13 around the passage 12. The surface of the substrate 7 is directed downwardly to the opening 9, and correcting chromium film chips lifted off are mounted from the chromium mask. Then, the folution 10 flows from the periphery the center of the substrate 7, and is intaked from an intake port 11. In this manner, the chip resist of the chromium film can be molten and removed, and can be treated in a short time without adherence to the substrate.
申请公布号 JPS5769741(A) 申请公布日期 1982.04.28
申请号 JP19800146557 申请日期 1980.10.20
申请人 FUJITSU KK 发明人 YOSHIZAWA TAKESHI
分类号 H01L21/30;G03F1/84;G03F7/26;G03F7/30;G03F7/42;H01L21/027;H01L21/306 主分类号 H01L21/30
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