| 摘要 |
An apparatus for cleaning a surface of an article such as a semiconductor wafer with cleaning fluid includes a nozzle extending from a chamber for developing a jet of cleaning fluid. The fluid is pressurized and megasonic energy is applied to the fluid by a megasonic transducer. The nozzle is shaped to provide a ribbon-like jet of cleaning fluid vibrating at megasonic frequencies for impingement on the surface of the article.
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