| 摘要 |
PURPOSE:To realize a multiplex alignment with high accuracy, by carrying out the alignment by means of an alignment mark provided slightly outside the exposure region of a mask. CONSTITUTION:An electron beam 22 is irradiated to a rotary target 21 to excite the soft X-rays 23. For instance, the ray 23 excited at the lower part is extracted to an exposure chamber 25 through an X-ray window 24. The chamber 25 is filled with He supplied through an He flow-in port 26. An exposure is carried out to a limited region 28 of a water 27 instead of a collective exposure to be given onto the entire surface of the water 27. This exposure of a minor region is repeated by shifting the wafer 27 in the plane direction. The alignment is carried out by means of an alignment mark 30 provided slightly outside the exposure region on the mask 29 and through an alignment mark detecting part 31. In such a way, a multiplex alignment is made possible under exposure. |
