| 摘要 |
PURPOSE:To obtain a developing device that forms a high precision pattern by alternately bringing >=2 kinds of solvents having so solubility individually but soluble when mixed, into contact with a macromolecular material layer that senses to a high energy line. CONSTITUTION:In a device that performs pattern forming consisting of a macromolecular material layer on a workpiece 3, which is used for work of a semiconductor element, optical applied parts, etc., for instance, the workpiece 3 having a pattern drawn with an electron beam on polystylene on a silicon wafer is put on a supporter and sprayed with poor solvent S1 (aceton, etc.) from a perforated pipe supplied by a vessel 7 through a solenoid valve 10 and a fixed quantity pump. After 19sec, also developing solvent S2 (cyclohexane, etc.) is sprayed from vessel 8. Then, it is taken out after the solvent is removed by sending a gas such as gaseous N2 from a pipe 9. This operation is carried out automatically by a control circuit 13. Thus, a high precision pattern of necessary polymer parts free from swelling and deformation can be obtained. |
