发明名称 Semiconductor inversion layer transistor
摘要 A semiconductor inversion layer transistor which is compatible with semiconductor fabrication technology, and an integrated circuit which incorporates a plurality of such transistors. In one embodiment of the transistor, a P type indium arsenide base and a P type gallium antimonide emitter are used while the collector can be made of either P type gallium antimonide or N type indium arsenide. By the nature of the band alignment at the interface, the indium arsenide base has its Fermi level pinned in the conduction ban at the base-emitter junction and an assymetrically conducting charge barrier which is formed at this junction is preferential to injection of carriers flowing from the emitter to the base rather than vice versa. When the base-emitter junction is forward biased the electrons at the junction are projected across the base with minimal hole injection from base to emitter, thus providing a high gain transistor having excellent high frequency characteristics.
申请公布号 US4326208(A) 申请公布日期 1982.04.20
申请号 US19800134235 申请日期 1980.03.26
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FANG, FRANK F.;SAI-HALASZ, GEORGE A.
分类号 H01L21/331;H01L29/205;H01L29/73;H01L29/737;H01L29/80;(IPC1-7):H01L29/16 主分类号 H01L21/331
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