| 摘要 |
PURPOSE:To wash the surface of a treated sensitive material by use of the saem treatment liquid, by providing 3 processes of a sensitive material part, a liquid stirring part and a sensitive material washing part, in one treatment liquid tank. CONSTITUTION:While a film 3 passes through the first process (a), the surface of a photosensitive film of the film 3 swells entirely, and in the second process (b), a treatment liquid 2 is jetted from a spray pipe 15 in the liquid, a flow is generated in the liquid, the liquid 2 is stirred, and a developing treatment is expedited. When the film 3 reaches the third process (c), the developed photosensitive surface is washed by the liquid 2 jetted from a spray pipe 16 of the outside of the liquid. In this regard, fatigue of the liquid 2 itself is prevented by making the liquid 2 circulate from the spray pipe 16 of the outside of the liquid, only when it has been detected that the film 3 passes through. |
